Lithography

Direct-write laser lithography

The tabletop µMLA system is a cutting-edge laser writing system for chrome-on-glass photomask fabrication. It is suitable for a wide range of microscale applications including but are not limited to microfluidics, MEMS, micro-optics, microlens arrays, sensors, etc.

Tool specs:

Minimum feature size: 1 µm
Minimum lines and space: 1.5 µm
Maximum Exposure Area: 150 x 150 mm²
Laser wavelength: 365 nm

Contact photolithography

The OAI 200IR Mask Aligner is for mask alignment and UV exposure application for Microfluidics, MEMS, etc. It provides collimated UV light in Near or Deep UV using lamps ranging in power from 200 to 2000 watts, and it is capable of one micron resolution and alignment precision.

Tool specs:
Substrate stage:

X, Y Travel ±10mm
Z Travel 1,500 microns
Rotation ±3.5˚